- All sections
- C - Chemistry; metallurgy
- C23F - Non-mechanical removal of metallic material from surfaces; inhibiting corrosion of metallic material; inhibiting incrustation in general; multi-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass or or class
- C23F 1/32 - Alkaline compositions
Patent holdings for IPC class C23F 1/32
Total number of patents in this class: 41
10-year publication summary
4
|
4
|
4
|
4
|
1
|
7
|
4
|
6
|
3
|
0
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Plastal Co., Ltd. | 6 |
3 |
Applied Materials, Inc. | 16587 |
2 |
Tokyo Electron Limited | 11599 |
2 |
ASM IP Holding B.V. | 1715 |
2 |
DONGWOO FINE-CHEM Co., Ltd. | 1163 |
2 |
Tokuyama Corporation | 1248 |
2 |
Versum Materials US, LLC | 591 |
2 |
Rtx Corporation | 8674 |
2 |
Samsung Electronics Co., Ltd. | 131630 |
1 |
3m Innovative Properties Company | 18406 |
1 |
LG Chem, Ltd. | 17205 |
1 |
The Boeing Company | 19843 |
1 |
Atotech Deutschland GmbH | 586 |
1 |
BYD Company Limited | 3700 |
1 |
FUJIFILM Electronic Materials U.S.A., Inc. | 270 |
1 |
IUCF-HYU (Industry-University Cooperation Foundation Hanyang University) | 1115 |
1 |
J.E.T. Co., Ltd. | 23 |
1 |
LG Household & Health Care Ltd. | 1300 |
1 |
MEC Company Ltd. | 76 |
1 |
Rohm and Haas Electronic Materials CMP Holdings, Inc. | 309 |
1 |
Other owners | 12 |